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题名 用旋转喷涂法制备的尖晶石薄膜的结构与磁性研究
姓名 王学文
院系 物理科学与技术学院
专业 磁学与磁性材料
学位名称 理学硕士
外文题名 Structure and magnetic properties studies of Spinel thin films Fabricate by spin spray plating method
第一导师姓名 李发伸
关键词 旋转喷涂;钴铁氧体;薄膜
外文关键词 spin spray;Co ferrite;thin film
学科 理学
摘要 电子元器件的小型化,集成化,需要大量的磁性薄膜材料。薄膜磁记录介质、磁盘、薄膜型磁头、薄膜变压器及薄膜电感器等的研究十分活跃。在常用的铁氧体薄膜制备中,材料晶化需要在高温下进行,这对基片的耐温性提出了较高的要求,给铁氧体薄膜在一些耐热性较差的基底材料如聚脂膜、聚合物颗粒、GaAs集成电路等非耐热基体上进行沉积带来了很大的困难,从而使基片材料的选择受到很大的限制。 本文通过自行设计的旋转喷涂装置,采用旋转喷涂法在低温下(〈100℃)制备了钴铁氧体薄膜。尽管是在低温下制备,但是铁氧体薄膜的磁性不逊于高温下所制备的。我们对于整个制备过程进行了分析,研究了不同制备条件和它对所制备的钴铁氧体薄膜结构和性能的影响。其中包括: 1.我们自行设计和加工了旋转喷涂装置。通过对于整个反应过程的分析,我们把旋转喷涂装置分为三个重要部分:旋转部分、温度控制部分、喷雾部分。 2.研究了旋转喷涂法制备钴铁氧体薄膜的工艺和条件;对于钴铁氧体薄膜的制备过程,我们进行了讨论和摸索,得到钴铁氧体薄膜的最佳制备温度是在90℃左右,我们在90℃的反应温度下得到了结晶完全、纯相的尖晶石结构的钴铁氧体薄膜。另外,我们研究了旋转平台对钴铁氧体薄膜制备和磁性的影响。得出在150rpm左右是制备钴铁氧体的最佳转速。 3.通过的穆斯堡尔谱结果的分析,我们得到了薄膜的磁矩分布。我们发现薄膜的磁矩与薄膜的法线的夹角为35°。 4.利用旋转喷涂装置,我们还制备了Fe3O4、MnZn铁氧体和NiZn铁氧体薄膜。
外文摘要 The miniaturization and integration of electron element need many magnetic thin films. Theresearch of them, like film magnetic recording medium, film magnetic disk, film head-disk, film transformer and film inductance appliance etc. attract a lot of interest. In the normal preparation technology of ferrite thin films, the preparation temperature should be carried on the high temperature, which requires the substrate with good heat resistance and results of many difficulty in the depositedon the substrate materials with bad heat resistance, like polyethlanetelephthalte(PET), Polymer grain,GaAs Integrated Circuit, etc. Hence the selection of substrate material is very restricted.In this dissertation, using the Spin-spray ferrite plating apparatus designed by ourselves, we prepared Co ferrite thin films under the low temperature(〈100℃), which does not need the heat treatment. Although prepared at low temperature, ferrite plated films exhibit magnetic properties asgood as those prepared at high temperature. We also analysing the whole preparation process and investigate the structure and magnetic properties of the Co ferrite thin films under the different preparation conditions.Firstly, the Spin-spray ferrite plating apparatus is designed and manufactured by ourselves. Through analysing the whole reaction process , we divide the Spin-spray ferrite plating apparatus into three important parts, including the spin part, temperature control part and spray part .Secondly, the technology and condition of preparation of Co ferrite thin film, in terms of Spin-sprayferrite plating method is studied. The preparation process of Co ferrite thin films is explored. It is foundthat the best temperature is about 90℃ where the crystal, single phase spinel Co ferrite thin film isobtained. In addition, the rotation speed of spin flat affects the preparation of Co ferrite thin film and itsmagnetic properties. The best rotate speed for the Co ferrite thin film is about 150rpm.Thirdly, by analysing the results of mÖssbauer, we find the angle between the magnetic momentOf film and normal line of film is 35 degree. This suggests that the magnetic moment of film has some inclination.Finally, We have fabricated Fe3O4、MnZn ferrite thin films and NiZn ferrite thin films by Spin-spray ferrite plating apparatus.
研究领域 磁学与磁性材料
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